| Titre : |
Fundamentals of Surface and Thin Film Analysis |
| Type de document : |
texte imprimé |
| Auteurs : |
Leonard, C. FELDMAN, Auteur ; James, W. MAYER, Auteur |
| Editeur : |
North-Holland Publishing Company |
| Année de publication : |
1986 |
| Importance : |
352 p. |
| ISBN/ISSN/EAN : |
978-0-444-00989-0 |
| Note générale : |
Contents
Preface
Symbols Used in the Text
Appendix |
| Catégories : |
Matière:Propriétés
Surfaces (technologie)
Transitions radiatives
|
| Index. décimale : |
530.4 Etats de la matière |
| Résumé : |
An Overview : Concepts, Units, and the Bohr Atom
Atomic Collisions and Backscattering Spectrometry
Energy Loss of Light Ions and Backscattering Depth Profiles
Sputter Depth Profiles and Secondary Ion Mass Spectrometry
Channeling
Electron-Electron Interactions and the Depth Sensitivity of Electron Spectroscopies
Surface Structure
Photon Absorption in Solids and EXAFS
X-ray Photoelectron Spectroscopy (XPS)
Radiative Transitions and the Electron Microprobe
Nonradiative Transitions and Auger Electron Spectroscopy
Nuclear Techniques : Activation Analysis and Prompt Radiation Analysis |
