Titre : | Fundamentals of Surface and Thin Film Analysis |
Type de document : | texte imprimé |
Auteurs : | Leonard, C. FELDMAN, Auteur ; James, W. MAYER, Auteur |
Editeur : | North-Holland Publishing Company |
Année de publication : | 1986 |
Importance : | 352 p. |
ISBN/ISSN/EAN : | 978-0-444-00989-0 |
Note générale : | Contents
Preface
Symbols Used in the Text
Appendix |
Catégories : | :Matière:Propriétés Surfaces (technologie) Transitions radiatives
|
Index. décimale : | 530.4 Etats de la matière |
Résumé : | An Overview : Concepts, Units, and the Bohr Atom
Atomic Collisions and Backscattering Spectrometry
Energy Loss of Light Ions and Backscattering Depth Profiles
Sputter Depth Profiles and Secondary Ion Mass Spectrometry
Channeling
Electron-Electron Interactions and the Depth Sensitivity of Electron Spectroscopies
Surface Structure
Photon Absorption in Solids and EXAFS
X-ray Photoelectron Spectroscopy (XPS)
Radiative Transitions and the Electron Microprobe
Nonradiative Transitions and Auger Electron Spectroscopy
Nuclear Techniques : Activation Analysis and Prompt Radiation Analysis |