| Titre : | Fundamentals of Surface and Thin Film Analysis |
| Type de document : | texte imprimé |
| Auteurs : | Leonard, C. FELDMAN, Auteur ; James, W. MAYER, Auteur |
| Editeur : | North-Holland Publishing Company |
| Année de publication : | 1986 |
| Importance : | 352 p. |
| ISBN/ISSN/EAN : | 978-0-444-00989-0 |
| Note générale : | Contents
Preface
Symbols Used in the Text
Appendix |
| Catégories : | :Matière:Propriétés
Surfaces (technologie)
Transitions radiatives
|
| Index. décimale : | 530.4 Etats de la matière |
| Résumé : | An Overview : Concepts, Units, and the Bohr Atom
Atomic Collisions and Backscattering Spectrometry
Energy Loss of Light Ions and Backscattering Depth Profiles
Sputter Depth Profiles and Secondary Ion Mass Spectrometry
Channeling
Electron-Electron Interactions and the Depth Sensitivity of Electron Spectroscopies
Surface Structure
Photon Absorption in Solids and EXAFS
X-ray Photoelectron Spectroscopy (XPS)
Radiative Transitions and the Electron Microprobe
Nonradiative Transitions and Auger Electron Spectroscopy
Nuclear Techniques : Activation Analysis and Prompt Radiation Analysis |
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